Utilize este identificador para referenciar este registo: http://hdl.handle.net/10451/35302
Título: Influence of solvents and composition of etch-and-rinse and self-etch adhesive systems on the nanoleakage within the hybrid layer
Autor: Ferreira, João Cardoso
Pires, Patricia Teixeira
Azevedo, Álvaro Ferreira
Oliveira, Sofia Arantes
Melo, Paulo Ribeiro
Silva, Mário Jorge
Palavras-chave: Etch-and-rinse adhesives
Self-etch adhesives
Hybrid layer
Data: 2013
Citação: Ferreira JC, Pires PT, Azevedo AF, et al. Influence of solvents and composition of etch-and-rinse and self-etch adhesive systems on the nanoleakage within the hybrid layer. The Journal of Contemporary Dental Practice. 2013;14(4):691-699.
Resumo: Aim: The goal of this study was to evaluate nanoleakage within the hybrid layer yielded by etch-and-rinse and self-etch adhesive systems, with different solvents and compositions. Materials and methods: Four adhesives were applied onto 20 human dentin disks: group A: Adper Scotchbond 1XT™ (3M ESPE), group B: One Coat Bond® (Coltène Whaledent), group C: AdheSE® (Ivoclar Vivadent) and group D: Xeno-V® (Dentsply). The samples were immersed in aqueous ammoniacal silver nitrate for 24 hour, prepared and observed under field-emission scanning electron microscopy with backscattered electrons. Microphotographs were scanned and data were processed. The mean value and standard deviation were calculated. Kruskal- Wallis and Mann-Whitney tests were used (p < 0.05). Results: All the adhesives showed nanoleakage within the hybrid layer: Adper Scotchbond 1XT™ (218.5 μm ± 52.6 μm), One Coat Bond® (139.6 μm ± 79.0 μm), AdheSE® (92.7 μm ± 64.8 μm) and Xeno-V® (251.0 μm ± 85.2 μm). AdheSE® yielded less nanoleakage than Adper Scotchbond-1XT™ (p = 0.003) and than Xeno-V® (p = 0.007). No other statistically significant differences were detected. Conclusion: Two-step self-etch adhesive system (AdheSE®) might contribute for lower nanoleakage deposition and thus better performance in dentin adhesion. Clinical significance: The two-step self-etch adhesive system showed the lowest nanoleakage deposition compared with the other adhesive systems evaluated, which seems to indicate a better behavior when a restoration is performed in dentin and possibly can lead to a durable adhesion along time.
Peer review: yes
URI: http://hdl.handle.net/10451/35302
Aparece nas colecções:FMD - Artigos em Revistas Internacionais

Ficheiros deste registo:
Ficheiro Descrição TamanhoFormato 
WU190_OLIs I_AI_2013.pdf289,35 kBAdobe PDFVer/Abrir    Acesso Restrito. Solicitar cópia ao autor!

FacebookTwitterDeliciousLinkedInDiggGoogle BookmarksMySpace
Formato BibTex MendeleyEndnote Degois 

Todos os registos no repositório estão protegidos por leis de copyright, com todos os direitos reservados.